|
The returned valve was patent.It met the requirements for valve flux, reflux, siphon, preimplantation and pressure-flow testing.Water was able to flow though the valve during testing.Therefore, the nature of the complaint could not be replicated by laboratory personnel.It did not meet the requirements for leak testing due to a puncture in the reservoir.It is unknown how or when the damage occured.The ifu cautions, ¿improper use of instruments in the handling or implantation of shunt products may result in the cutting, slitting or crushing of component.Such damage may lead to loss of shunt integrity¿¿ proteinaceous debris was observed on the exterior of the valve.Crystalline debris was observed on the interior of the valve.The in structions for use cautions, ¿shunt obstruction may occur in any of the components of the shunt system.The system may become occluded internally due to tissue fragments, blood clots, tumor cell aggregates, bacterial colonization or other debris¿ and ¿care must be taken to ensure that particulate contaminates are not introduced into the shunt components during preimplantation testing or handling.Introduction of contaminants could result in improper performance of the shunt system.Particulate matter that enters the shunt system may result in shunt occlusion, or may also hold pressure/flow controlling mechanisms open, resulting in overdrainage.¿ all valves are 100% tested at the time of manufacture.If information is provided in the future, a supplemental report will be issued.
|